On: Intel’s Manufacturing Roadmap from 2019 to 2029

[vardump]

> Even if EUV tool does 1 exposure a little bit slower than quadruple patterning, it can do 4 patterning steps in one — a very huge thing in process technology.

Would that also remove some patterning constraints? Give the pattern "more freedom".

[baybal2 → vardump]

Yes, this is another big thing about it