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>And I'm sure one of the improvements is to use 5nm or 3nm process.

Implementing a process shrink is not just scaling the masks by the appropriate percentage. It often is a completely different optical train, at a different wavelength, different pellicle, changing the refractive index of the immersion fluid, different multiple patterning. It takes months (years?) of work.

For many applications it's worth it, but it's not at all a slam dunk. The vast majority of ASICs are designed for a particular node and never upgraded. It's the kind of crazy long-term speculative capital investment TSLA might have indulged in when the stock was at $414 a share, but it's nowhere remotely near that today.

They're already engaging in layoffs, today. Why spend the money?




> vast majority of ASICs are designed for a particular node and never upgraded

They are, if the new node is cheap enough to justify the investment in shrinking the design. In most ASICs, being faster won’t make people rip out their embedded electronics for new models.




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